Very large scale integration of nanopatterned YBa2Cu3O7-delta Josephson junctions in a two-dimensional array.
Very large scale integration of nanopatterned YBa2Cu3O7-delta Josephson junctions in a two-dimensional array.
复制标题
纳米图案 YBa2Cu3O7-delta 约瑟夫森结在二维阵列中的超大规模集成。
DOI：
--
复制
发表时间：
2009
期刊：
影响因子：
--
通讯作者：
R. Dynes
中科院分区：
文献类型：
--
作者：
S. Cybart;S. Anton;Stephen M. Wu;J. Clarke;R. Dynes
利用电子束光刻和反应离子刻蚀技术，通过纳米掩模中的狭缝对YBa（2）Cu（3）O（7-delta）薄膜进行离子辐照，实现了约瑟夫森结在二维串并联阵列中的超大规模集成。该掩模由15820个高纵横比（20：1）、35 nm宽的狭缝组成，该狭缝限制下面的膜中的照射以形成约瑟夫森结。表征每个平行段k，包含28个路口，与一个单一的临界电流I（CK），我们发现在I（CK）的标准偏差约为16%。
Very large scale integration of Josephson junctions in a two-dimensional series-parallel array has been achieved by ion irradiating a YBa(2)Cu(3)O(7-delta) film through slits in a nanofabricated mask created with electron beam lithography and reactive ion etching. The mask consisted of 15820 high aspect ratio (20:1), 35 nm wide slits that restricted the irradiation in the film below to form Josephson junctions. Characterizing each parallel segment k, containing 28 junctions, with a single critical current I(ck) we found a standard deviation in I(ck) of about 16%.