Thermally Activated Reactions of Phenol at the Ge(100)-2 × 1 Surface
Thermally Activated Reactions of Phenol at the Ge(100)-2 × 1 Surface
复制标题
苯酚在 Ge(100)-2 × 1 表面的热激活反应
DOI:
10.1021/acs.jpcc.0c06314
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发表时间:
2020
期刊:
影响因子:
--
通讯作者:
Bent, Stacey F.
中科院分区:
文献类型:
--
作者:
Shong, Bonggeun;Ansari, Abu Saad;Bent, Stacey F.
Organic functionalization of semiconductor surfaces may be utilized to couple the properties of semiconductor materials with organic molecules. In this work, the adsorption and thermal reactions of phenol on the Ge(100)-2 × 1 surface were studied. A combination of multiple internal reflection Fourier transform infrared (MIR-FTIR) spectroscopy under ultrahigh vacuum (UHV) conditions and density functional theory (DFT) calculations was used to elucidate the surface chemical reactions of phenol. While phenol initially chemisorbs on Ge(100)-2 × 1 at 300 K via O–H dissociation to form phenoxy (C6H5O*), annealing to 573 K transforms the adsorbate into phenyl (C6H5*). A sequential reaction pathway for the migration of oxygen into substrate and formation of phenyl is suggested, which requires significant thermal activation and yields slight exothermicity.
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