Surface Modification of Niobium (Nb) by Atomic Force Microscope (AFM) Nano-Oxidation Process
Surface Modification of Niobium (Nb) by Atomic Force Microscope (AFM) Nano-Oxidation Process
复制标题
通过原子力显微镜 (AFM) 纳米氧化工艺对铌 (Nb) 进行表面改性
DOI：
10.1143/jjap.35.l1524
复制
发表时间：
1996
影响因子：
1.5
通讯作者：
M. Konagai
中科院分区：
文献类型：
--
作者：
J. Shirakashi;M. Ishii;K. Matsumoto;N. Miura;M. Konagai
首次利用原子力显微镜（AFM）纳米氧化过程研究沉积在SiO2/Si基底上的铌（Nb）薄膜的纳米级表面改性。通过向空气中的金属涂层导电悬臂施加负偏压来制造改进的结构。通过改变悬臂的扫描速度和施加的负偏压可以很好地控制修饰结构的尺寸。通过将负偏压从7 V更改为20 V，可以控制修改结构的尺寸，宽度范围为18 nm至93 nm，高度范围为0.5 nm至5 nm。通过俄歇电子能谱（AES）分析表明，改性结构由Nb和大量氧（O）组成，表明形成了Nb氧化物。
Nanometer-scale surface modification of niobium (Nb) thin films deposited on SiO2/Si substrates was investigated by means of the atomic force microscope (AFM) nano-oxidation process for the first time. The modified structures were fabricated by applying negative bias voltages to the metal-coated conductive cantilever in air. The size of the modified structures was well controlled by changing the scanning speed of the cantilever and the applied negative bias voltage. By changing the negative bias voltage from 7 V to 20 V, the size of the modified structures was controlled, ranging from 18 nm to 93 nm in width and 0.5 nm to 5 nm in height. Through Auger electron spectroscopy (AES) analysis, it is revealed that the modified structure consists of Nb and a large amount of oxygen (O), suggesting the formation of Nb oxide.