Electron-electron interaction and weak localization
Electron-electron interaction and weak localization
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DOI：
10.1007/bf00681807
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发表时间：
1984-09
影响因子：
2
通讯作者：
W. Eiler
中科院分区：
文献类型：
--
作者：
W. Eiler
本文给出了非弹性电子-电子散射过程对金属薄膜中弱局域化效应的一致性描述。不同的技术被用来处理强非弹性过程和准弹性碰撞，特别注意后者的处理。计算给出了粒子-粒子传播子衰变率的上限。该速率与温度成比例，并且相当强烈地依赖于膜的电导。磁导的计算将该速率与可测量的量联系起来，并且还揭示了对磁场的依赖性。最后，提出了一种避免分裂成两个能量区域的描述。
A consistent description of the effects of inelastic electron-electron scattering processes on weak localization in thin metal films is presented. Different techniques are used to treat strongly inelastic processes and quasielastic collisions, with special attention to the treatment of the latter. The calculations give an upper bound for the decay rate of the particle-particle propagator. This rate is proportional to the temperature and depends rather strongly on the conductance of the film. The calculation of the magnetoconductance connects this rate with measurable quantities and also reveals a dependence on the magnetic field. Finally, a description that avoids the splitting into two energy regions is presented.