Characterization of growing thin films by in situ ellipsometry, spectral reflectance and transmittance measurements, and ion‐scattering spectroscopy
Characterization of growing thin films by in situ ellipsometry, spectral reflectance and transmittance measurements, and ion‐scattering spectroscopy
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通过原位椭圆光度法、光谱反射率和透射率测量以及离子散射光谱表征生长薄膜
DOI：
10.1063/1.1138408
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发表时间：
1985
期刊：
影响因子：
--
通讯作者：
C. Pacey
中科院分区：
文献类型：
--
作者：
R. Netterfield;P. Martin;W. Sainty;R. M. Duffy;C. Pacey
介绍了一种多功能超高真空薄膜沉积和分析系统。薄膜是通过电子束蒸发沉积的，并有可能对生长的薄膜进行离子束轰击。涂层表面的反射率和/或透射率的测量可以在16个波长的可见光或红外光谱中同时进行。椭偏测量也可以在原地进行，在一个波长和单一入射角，通过一个椭偏仪，可以在自动旋转分析仪模式或手动零模式下操作。该系统还配备了一个产生亚毫米光斑的离子枪，以及一个半球形扇形离子能量分析仪，用于研究薄膜表面的离子散射光谱。在金膜沉积过程中得到的结果证明了该系统的性能。
A versatile ultrahigh‐vacuum thin‐film deposition and analysis system is described. Films are deposited by electron beam evaporation with the possibility of ion beam bombardment of the growing film. Measurements of the reflectance and/or transmittance of the coating surface can be made simultaneously at 16 wavelengths across the visible or infrared spectrum. Ellipsometric measurements can also be made in situ, at a single wavelength and single angle of incidence, by an ellipsometer which can operate in either an automatic rotating analyzer mode or a manual nulling mode. The system is also equipped with an ion gun producing a submillimeter spot, and with a hemispherical sector, ion energy analyzer for ion scattering spectroscopy studies of the film surface. Results obtained during the deposition of a gold film are presented to demonstrate the capability of the system.