Crystallization of sputtered lead zirconate titanate films by rapid thermal processing
Crystallization of sputtered lead zirconate titanate films by rapid thermal processing
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快速热处理溅射锆钛酸铅薄膜的结晶
DOI:
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发表时间:
1992
期刊:
影响因子:
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通讯作者:
M. Sayer
中科院分区:
文献类型:
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作者:
C. V. Kumar;R. Pascual;M. Sayer
A rapid thermal annealing (RTA) technique has been employed to process lead zirconate titanate (PZT) films prepared by reactive magnetron sputtering. The films were fabricated by dc sputtering a multielement metal target in an oxygen ambient at a substrate temperature of 200 °C. A subsequent postdeposition RTA at 600 °C for 5 s crystallizes the films into a perovskite‐type structure through various intermediate phases. Due to the short postdeposition processing times inherent in the RTA method, the initial nature of the as‐grown films has a critical influence on the crystallization kinetics. The reaction sequence in the formation of perovskite PZT from the films deposited at low substrate temperatures by the sputtering technique has been evaluated, and various key factors influencing the crystallization of PZT have been identified. As‐grown films are constituted of polycrystalline orthorhombic lead oxide in an amorphous matrix of titania and zirconia. During annealing lead oxide transforms into a cubic ph...