SD imaging method of ex vivo brain preparation
SD imaging method of ex vivo brain preparation
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离体脑制备的SD成像方法
DOI：
10.1166/jnsne.2013.1051
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发表时间：
2013
期刊：
影响因子：
--
通讯作者：
and Yoko Tominaga
中科院分区：
文献类型：
--
作者：
Takashi Tominaga;Riichi Kajiwara;and Yoko Tominaga
使用电压敏感染料（VSD）成像方法对大规模神经元回路进行功能分析已变得越来越流行。低信噪比是VSD成像方法不可避免的问题。本文综述了信噪比与光子散粒噪声和基线噪声之间的关系，并解释了VSD对膜电位变化的敏感性小导致这一问题。在此基础上，我们将展示实验装置的要求，以解决这些困难，集中在离体标本，如脑切片制备和隔离的全脑制备的神经回路的功能分析。这些讨论将有助于显示VSD成像方法用于分析大脑神经元网络活动的当前局限性和益处。
Functional analysis of large-scale neuronal circuits using the voltage-sensitive dye (VSD) imaging method has become increasingly popular. Poor signal-to-noise ratio (SNR) is an unavoidable problem for the VSD imaging method. This review shows the relation between the SNR and the photon shot noise and baseline noise, and explains that the small sensitivity of VSD to membrane potential changes causes this problem. Based on this discussion, we will show the requirements for the experimental apparatus to work around these difficulties, focusing on the functional analysis of neural circuits in ex vivo specimen such as brain slice preparation and isolated whole brain preparation. These discussions will be useful for showing the current limitations and benefits of the VSD imaging method for analyzing the neuronal network activities of the brain.