EBSD characterization of crystallographic orientations and twin interfaces of modulated martensite in epitaxial NiMnGa thin film
EBSD characterization of crystallographic orientations and twin interfaces of modulated martensite in epitaxial NiMnGa thin film
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外延 NiMnGa 薄膜中调制马氏体的晶体取向和孪晶界面的 EBSD 表征
DOI：
10.1088/1757-899x/82/1/012063
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发表时间：
2014-08
期刊：
影响因子：
--
通讯作者：
Zuo Liang
中科院分区：
文献类型：
--
作者：
Yang Bo;Zhang Yudong;Li Zongbin;Qin Gaowu;Esling Claude;Zhao Xiang;Zuo Liang
利用X射线衍射（XRD）和电子背散射衍射（EBSD）研究了外延Ni50Mn30Ga20薄膜中7M调制马氏体的晶体结构和全局织构，并揭示了与显微结构特征相关的局部晶体取向。7M马氏体的显微组织可分为两种不同的成分。一种是指具有相对均匀对比度的长直条，平行于基底的一个边缘方向延伸。另一种是指具有相对高的相对对比度的较短且弯曲的板，其以板长度方向相对于基板边缘大致成45°取向。每个7M马氏体板被指定为单个取向变体，并且彼此孪晶相关的四个取向变体构成一个变体组。根据马氏体片的局部晶体学取向和片间界面痕迹的取向，确定了低、高相对反差区的Ⅰ型、Ⅱ型和复合孪晶界面。
The crystal structure and the global texture of 7M modulated martensite in epitaxial Ni50Mn30Ga20 thin films were investigated by X-ray diffraction (XRD), and the local crystallographic orientations correlated with microstructural features were revealed by electron backscatter diffraction (EBSD). The microstructure of 7M martensite can be classified into two distinct constituents. One refers to long straight strips with relatively homogeneous contrast, running parallel to one edge direction of the substrate. The other refers to shorter and bent plates with relatively high relative contrast, being oriented with the plate length direction roughly in 45° with respect to the substrate edges. Each 7M martensite plate is designated as a single orientation variant, and four orientation variants that are twin-related one another constitute one variant group. With the local crystallographic orientations of martensite plates and the orientations of inter-plate interface traces, the Type I, Type II and compound twin interfaces in the low and high relative contrast zones were determined.
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影响因子：
3.3
作者：
Kaufmann, S.;Niemann, R.;Faehler, S.
通讯作者：
Faehler, S.
影响因子：
6.1
作者：
H. Bunge;C. Esling;J. Muller
通讯作者：
H. Bunge;C. Esling;J. Muller
影响因子：
8.6
作者：
S. Kauffmann-Weiss;M. Gruner;A. Backen;L. Schultz;P. Entel;S. Fähler
通讯作者：
S. Kauffmann-Weiss;M. Gruner;A. Backen;L. Schultz;P. Entel;S. Fähler
影响因子：
9.4
作者：
D. Cong;Yudong Zhang;Yandong Wang;M. Humbert;Xiang Zhao;Tadao Watanabe;L. Zuo;C. Esling
通讯作者：
D. Cong;Yudong Zhang;Yandong Wang;M. Humbert;Xiang Zhao;Tadao Watanabe;L. Zuo;C. Esling
影响因子：
9.4
作者：
J. Tillier;D. Bourgault;P. Odier;L. Ortega;S. Pairis;O. Fruchart;N. Caillault;L. Carbone
通讯作者：
J. Tillier;D. Bourgault;P. Odier;L. Ortega;S. Pairis;O. Fruchart;N. Caillault;L. Carbone