Role of surface roughness in hard-x-ray emission from femtosecond-laser-produced copper plasmas
Role of surface roughness in hard-x-ray emission from femtosecond-laser-produced copper plasmas
复制标题
表面粗糙度在飞秒激光产生的铜等离子体的硬 X 射线发射中的作用
DOI：
--
复制
发表时间：
2001
期刊：
影响因子：
--
通讯作者：
G. Kumar
中科院分区：
文献类型：
--
作者：
P. Rajeev;S. Banerjee;A. Sandhu;L. Tribedi;G. Kumar
研究了100fs， 806nm激光脉冲在10155w - 1016w cm - 2范围内产生的铜等离子体在30- 300kev能量范围内的硬x射线发射。我们证明了目标的表面粗糙度在光与等离子体的耦合中超越了极化状态的作用。我们进一步表明，表面粗糙度对上述能量范围内的x射线发射有显著的增强作用。
Hard x-ray emission in the energy range of 30-300 keV from copper plasmas produced by 100-fs, 806-nm laser pulses at intensities in the range of 10 1 5 -10 1 6 W cm - 2 is investigated. We demonstrate that surface roughness of the targets overrides the role of polarization state in the coupling of light to the plasma. We further show that surface roughness has a significant role in enhancing the x-ray emission in the above mentioned energy range.