Spectroscopic characterization and simulation of chemical sputtering using the DiMES porous plug injector in DIII-D
Spectroscopic characterization and simulation of chemical sputtering using the DiMES porous plug injector in DIII-D
复制标题
使用 DIII-D 中的 DiMES 多孔塞注射器进行化学溅射的光谱表征和模拟
DOI：
10.1016/j.jnucmat.2006.12.062
复制
发表时间：
2006
影响因子：
3.1
通讯作者：
C. Wong
中科院分区：
文献类型：
--
作者：
A. McLean;J. Davis;P. Stangeby;N. Brooks;D. Whyte;S. Allen;B. Bray;S. Brezinsek;J. Elder;M. Fenstermacher;M. Groth;A. A. Haasz;E. Hollmann;R. Isler;C. Lasnier;D. Rudakov;J. Watkins;W. West;C. Wong
DIII-D偏滤器材料评估系统（DiMES）的独立气体注入系统已被用于托卡马克偏滤器环境中化学侵蚀的原位研究。多孔塞注入器（PPI）通过与瓦片齐平的多孔石墨表面以受控速率将甲烷释放到等离子体中。以这种方式，可以最小化对局部等离子体的扰动，同时还模拟从固体石墨表面释放的甲烷分子的直接环境。测量当地等离子体条件下的光子效率的CH 4的报告。原则上，化学溅射与物理溅射对靶处C+源的贡献可以通过测量PPI释放CH 4期间的CII和CD/CH波段发射以及由于本征发射来评估。这些新的实验工具的第一个结果证明了PPI在未来DIII-D应用中提供明确结果的潜力，并表明了获得可靠定量结论所需的改进。
A self-contained gas injection system for the Divertor Material Evaluation System (DiMES) on DIII-D has been employed for in situ study of chemical erosion in the tokamak divertor environment. The porous plug injector (PPI) releases methane into the plasma at a controlled rate through a porous graphite surface flush to a tile. In this way, the perturbation to the local plasma can be minimized, while also simulating the immediate environment of methane molecules released from a solid graphite surface. Photon efficiencies of CH4for measured local plasma conditions are reported. The contribution of chemical vs physical sputtering to the source of C+at the target can, in principle, be assessed through measurement of CII and CD/CH band emissions during release of CH4from the PPI, and due to intrinsic emission. These first results from this new experimental tool demonstrate the potential for the PPI to provide definitive results in future applications in DIII-D and indicate the improvements required to obtain firm quantitative conclusions.