Understanding the release of helium atoms from nanochannel tungsten: a molecular dynamics simulation
Understanding the release of helium atoms from nanochannel tungsten: a molecular dynamics simulation
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了解氦原子从纳米通道钨中的释放：分子动力学模拟
DOI：
10.1088/1741-4326/ab14c7
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发表时间：
2019-06
期刊：
影响因子：
3.3
通讯作者：
Deng Huiqiu
中科院分区：
文献类型：
--
作者：
Wei Guo;Ren Feng;Fang Jingzhong;Hu Wangyu;Gao Fei;Qin Wenjing;Cheng Tao;Wang Yongqiang;Jiang Changzhong;Deng Huiqiu
高耐辐射的面向等离子体材料（PFMs）的设计对聚变堆具有重要意义。我们最近的实验表明，纳米通道钨（W）薄膜具有明显的上级耐辐射性能。本文采用分子动力学模拟方法研究了氦在纳米钨通道中的聚集和释放。研究了温度和空位浓度对氦从钨柱中释放的影响。我们的研究结果表明，由薄W圆柱体组成的纳米通道W比具有平坦表面的大块W更快地释放He原子，从而大大降低He浓度并抑制He气泡的形成和生长，这导致增加的辐射耐受性。此外，由于增加He注量而引起的纳米通道W中的微结构变化小于体W中的微结构变化。虽然纳米通道W中的空位会捕获He原子，但纳米通道W也具有比体W更强的稳定氦保留的倾向。同时还研究了氦从纳米通道W中释放的机理。本文的研究结果对今后抗辐射功能模块的设计具有一定的指导意义。
The design of highly radiation-tolerant plasma-facing materials (PFMs) is of great importance for fusion reactors. Our recent experiments have shown that nanochannel tungsten (W) films have clearly superior radiation tolerance properties. In the present work, helium clustering and release from nanochannel tungsten were studied by molecular dynamics simulations. The effects of temperature and vacancy concentration on the helium release from a tungsten cylinder were investigated. Our results show that nanochannel W that consists of thin W cylinders releases He atoms more quickly than bulk W with flat surfaces, thus greatly reducing the He concentration and suppressing the formation and growth of He bubbles, which leads to increased radiation tolerance. Moreover, the microstructural changes due to increasing He fluence are smaller in nanochannel W than those in bulk W. Although vacancies in nanochannel W will trap He atoms, the nanochannel W also has a stronger tendency to stabilize helium retention than bulk W. The mechanism of helium release from nanochannel W was also examined. The results reported here are beneficial for guiding future work in the design of radiation resistant PFMs.
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DOI：
10.1016/b978-0-12-780621-1.50005-8
发表时间：
1988
期刊：
--
影响因子：
--
作者：
J. Ziegler
通讯作者：
J. Ziegler
影响因子：
3.3
作者：
El-Atwani, O.;Gonderman, Sean;Allain, J. P.
通讯作者：
Allain, J. P.
影响因子：
3.1
作者：
M. Shimada;A. Costley;G. Federici;K. Ioki;A. Kukushkin;V. Mukhovatov;A. Polevoi;M. Sugihara
通讯作者：
M. Shimada;A. Costley;G. Federici;K. Ioki;A. Kukushkin;V. Mukhovatov;A. Polevoi;M. Sugihara
影响因子：
3.1
作者：
El-Atwani, O.;Nathaniel, J. E., II;Taheri, M. L.
通讯作者：
Taheri, M. L.
影响因子：
3.1
作者：
Bolt, H;Barabash, V;Sato, K
通讯作者：
Sato, K