Probing interfacial and bulk magnetic hysteresis in roughened CoFe thin films
Probing interfacial and bulk magnetic hysteresis in roughened CoFe thin films
复制标题
探测粗糙 CoFe 薄膜中的界面和体磁滞
DOI：
--
复制
发表时间：
1998
期刊：
影响因子：
--
通讯作者：
C. Kao
中科院分区：
文献类型：
--
作者：
J. Freeland;K. Bussmann;P. Lubitz;Y. Idzerda;C. Kao
具有不同粗糙度的CoFe薄膜的界面磁矩的滞后行为是通过监测所施加的磁场的依赖性的镜面和非镜面（扩散）的贡献的X射线共振磁散射信号的元素特定的方式来确定。增加界面粗糙度产生了较大的变化的相对矫顽场相关联的界面力矩相比，散装。
The hysteretic behavior of interfacial magnetic moments for CoFe thin films with varying roughness is determined in an element specific manner by monitoring the applied magnetic field dependence of the specular and off-specular (diffuse) contributions to the x-ray resonant magnetic scattering signal. Increasing the interfacial roughness generates a larger variation of the relative coercive field associated with the interfacial moment in comparison to the bulk.