Er3+,Yb3+:YVO4 waveguides deposited on amorphous SiO2 by PLD and UVPLD
Er3+,Yb3+:YVO4 waveguides deposited on amorphous SiO2 by PLD and UVPLD
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DOI：
10.1016/j.tsf.2009.12.069
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发表时间：
2010-06
期刊：
影响因子：
2.1
通讯作者：
D. Milev;P. Atanasov;A. Dikovska;I. Dimitrov;K. Petrov;G. Avdeev
中科院分区：
文献类型：
--
作者：
D. Milev;P. Atanasov;A. Dikovska;I. Dimitrov;K. Petrov;G. Avdeev
采用脉冲激光沉积法(PLD)和紫外光辅助脉冲激光沉积法(UVPLD)在非晶态SiO{sub2}衬底上制备了Er3+和ErYb3+共掺YVO{sub4}光波导薄膜。研究了沉积工艺对薄膜的结构、形貌和光学性能的影响。在较低掺杂浓度下，UVPLD法制备的薄膜具有较好的结晶度和光学性能。所有样品都显示出平行于衬底表面的(001)区轴择优取向。多晶样品的TE极化和TM极化的折射率{Delta}n({Delta}n=n{subTE}-n{subTm})不同。
In this work, erbium, and erbium and ytterbium co-doped YVO{sub 4} waveguiding thin films were deposited on amorphous SiO{sub 2} substrates by pulsed laser deposition (PLD) and ultraviolet-assisted pulsed laser deposition (UVPLD). The influence of the deposition technique on the structure, morphology, and optical properties of the films was investigated. At lower dopant concentrations the films prepared by UVPLD show better crystallinity and optical properties. All the samples show preferred orientation of the (001) zone axes parallel to the substrate surface. The polycrystalline samples show difference in the refractive indexes {Delta}n ({Delta}n = n{sub TE} - n{sub TM}) for the TE and TM polarizations.