Fabrication of Au micropatterns on vertical Si sidewalls using flexible PDMS shadow masks
Fabrication of Au micropatterns on vertical Si sidewalls using flexible PDMS shadow masks
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DOI：
10.1088/0960-1317/20/12/127001
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发表时间：
2010-12-01
影响因子：
2.3
通讯作者：
Luo, Cheng
中科院分区：
文献类型：
--
作者：
Wang, Hui;Chakraborty, Anirban;Luo, Cheng
传统的光刻方法擅长于图案化衬底的顶表面，但不适合于在凹结构的侧壁上产生图案。在本技术说明中，我们报告了一种使用柔性聚二甲基硅氧烷（PDMS）荫罩生成侧壁微图案的简单方法。在这种方法中，首先将具有中空结构的薄PDMS膜放置在Si侧壁上。然后，使用该柔性PDMS膜作为荫罩，将Au膜热涂覆在基板上。最后，在去除PDMS膜之后，在Si侧壁上留下Au图案。使用这种方法，我们已经成功地产生了10 μ m的Au点和20 μ m宽的Au线上的垂直Si侧壁。
Traditional lithographic approaches are good at patterning the top surface of a substrate, but are not suited to producing patterns on the sidewalls of concave structures. In this technical note, we report a simple approach to generate sidewall micropatterns using flexible polydimethylsiloxane ( PDMS) shadow masks. In this approach, a thin PDMS membrane with hollow structures was first placed against a Si sidewall. A Au film was then thermally coated on the substrate using this flexible PDMS membrane as a shadow mask. Finally, after the removal of the PDMS membrane, Au patterns were left on the Si sidewall. Using this approach, we have successfully produced 10 mu m Au dots and 20 mu m wide Au lines on vertical Si sidewalls.