Origin of High Coercivity in Chemically Deposited Cobalt‐Phosphorus Films
Origin of High Coercivity in Chemically Deposited Cobalt‐Phosphorus Films
复制标题
化学沉积钴磷薄膜中高矫顽力的起源
DOI：
10.1063/1.1708378
复制
发表时间：
1966
影响因子：
3.2
通讯作者：
J. Morrison
中科院分区：
文献类型：
--
作者：
D. Speliotis;J. Judge;J. Morrison
通过化学沉积制备Co-P膜，其组成从2.5%至5% P变化，厚度从200至2500 A变化。这些薄膜的矫顽力被发现是一个函数的P含量和厚度。这些膜的颗粒尺寸随着厚度的增加而增加，并且是P含量的函数。将膜在还原气氛中在高达500°C的各种温度下退火。低矫顽磁力薄膜在250°C的温度下发生转变，成为矫顽磁力为250 Oe的薄膜。中等介电常数薄膜基本保持不变，而高介电常数薄膜的介电常数在400°C时急剧下降到250 Oe的表观"平衡介电常数“。对这些样品进行的蚀刻实验表明，对介电常数没有显著影响。渗透率只是沿着原始的渗透率-厚度曲线沿着返回。结构和磁性的证据表明，存在一个平衡的磁性结构，在这些薄膜中，这是预…
Films of Co‐P, varying in composition from 2.5% to 5% P and varying in thickness from 200 to 2500 A, were prepared by chemical deposition. The coercivity of these films was found to be a function of both P content and thickness. The particle size of these films increased with increasing thickness and was a function of the P content. The films were annealed in a reducing atmosphere at various temperatures up to 500°C. The low‐coercivity films undergo a transformation to films exhibiting coercivities of ∼250 Oe at a temperature of 250°C. The intermediate‐coercivity films remain essentially unchanged, whereas the high‐coercivity films drop sharply in coercivity at ∼400°C to this apparent ``equilibrium coercivity'' of ∼250 Oe. Etching experiments on these samples show no drastic effects on coercivity. The coercivity merely proceeds back along the original coercivity‐versus‐thickness curves. Structural and magnetic evidence indicates the existence of an equilibrium magnetic structure in these films which is pr...