Flash vacuum-ultraviolet source utilizing a surface-discharge substrate
Flash vacuum-ultraviolet source utilizing a surface-discharge substrate
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利用表面放电基板的闪蒸真空紫外线源
DOI:
10.1117/12.145775
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发表时间:
1993
期刊:
影响因子:
--
通讯作者:
T. Yanagisawa
中科院分区:
文献类型:
--
作者:
M. Sagae;E. Sato;A. Shikoda;T. Oizumi;Y. Hayasi;T. Shoji;K. Shishido;Y. Tamakawa;T. Yanagisawa
The fundamental studies for the flash vacuum-ultraviolet (VUV) source utilizing a surface- discharge substrate are described. This flash VUV source consists of the following essential components: a high-voltage power supply, a polarity-inversion-type high-voltage pulser with a condenser capacity of 14.3 nF, an oil diffusion pump, and a flash VUV chamber with a glass body. The VUV chamber employed a surface-discharge ferrite substrate that's pattern was formed by means of the copper vacuum evaporation and was connected to an oil diffusion pump with a pressure of 1.3 X 10-3 Pa. The combined ceramic condenser in the pulser was charged from 10 to 30 kV by a power supply, and the electric charges in the condenser were discharged to the radiation chamber after closing a gap switch. Then the flash VUV rays were generated. The maximum values of the cathode voltage and the tube current were about -21 kV and 1.7 kA, respectively. The VUV outputs were measured by a combination of a plastic scintillator and a photomultiplier. The pulse durations of the VUV rays were nearly equivalent to the durations of the damped oscillations of the voltage and current, and their values were about 10 microsecond(s) .
DOI:
--
发表时间:
2005
期刊:
SPIE 5580
影响因子:
--
作者:
E.Sato;M.Sagae;M.Komatsu;R.Germer;E.Tanaka;H.Mori;T.Kawai;T.Ichimaru;S.Sato;H.Ojima;K.Takayama;H.Ido
通讯作者:
H.Ido