A refined Ehrlich–Schwoebel effect on the modification of Si surface nanostructures by post ion milling
A refined Ehrlich–Schwoebel effect on the modification of Si surface nanostructures by post ion milling
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DOI：
10.1016/j.apsusc.2007.09.009
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发表时间：
2008-02
影响因子：
6.7
通讯作者：
Jing Zhou;W. Fan;Wenbin Chen;You-yuan Zhao;Ming Lu
中科院分区：
文献类型：
--
作者：
Jing Zhou;W. Fan;Wenbin Chen;You-yuan Zhao;Ming Lu
对离子束溅射后的一种新的纳米结构改性方法--离子束后铣（PIM）进行了模拟研究。实验发现，对于具有足够低的离子通量的PIM，Si（100）上的Si纳米点阵列的平均点尺寸和表面粗糙度均随研磨时间稳定地下降。然而，通常采用的Kuramoto-Sivashinsky（KS）模型，涉及Bradley-Harper（BH）理论未能解释实验结果，也没有KS模型，结合BH和Ehrlich-Schwoebel（ES）效应。我们重新研究了KS方程中的ES项，并导出了反映ES贡献的新项。经过这样的修改，包含BH和精细ES效应的KS模型最终对PIM结果给出了定性的解释。
A modeling work has been conducted on a phenomenon called post ion milling (PIM), a post-treatment of Ar+ion sputtering to modify nanostructures on solid surface. It was found by experiments that for PIM with a sufficiently low ion flux, both the average dot size and the surface roughness of Si nanodot arrays on Si(100) decline steadily against milling time. However, the usually adopted Kuramoto–Sivashinsky (KS) model involving the Bradley–Harper (BH) theory failed to explain the experimental results, nor the KS model that combines both the BH and Ehrlich–Schwoebel (ES) effects. We reexamined the ES term in the KS equation, and derived new terms reflecting the ES contribution. With such a modification, the KS model involving both the BH and the refined ES effects finally gave a qualitative explanation to the PIM result.