Plasma-resistant dense yttrium oxide film prepared by aerosol deposition process
Plasma-resistant dense yttrium oxide film prepared by aerosol deposition process
复制标题
DOI：
10.1111/j.1551-2916.2007.01738.x
复制
发表时间：
2007-08-01
影响因子：
3.9
通讯作者：
Uematsu, Keizo
中科院分区：
文献类型：
--
作者：
Iwasawa, Junichi;Nishimizu, Ryoichi;Uematsu, Keizo
在室温下通过气溶胶沉积工艺在石英衬底上制备了致密的氧化钇薄膜。沉积速率非常高，为 60 m/h。在石英基板上很容易实现 10 m 的厚膜。透射电子显微镜显示薄膜致密且无空隙，由随机取向的Y2O3微晶组成，尺寸小于20 nm。薄膜层和石英基板之间的界面是均匀的。该薄膜（2米厚）在250-800 nm波长范围内具有高透射率（55-85%）。该薄膜的机械性能非常好。 Y2O3层与石英基板界面的附着力超过80 MPa。膜的维氏硬度为7.7GPa。该薄膜在CF4/O-2气体混合物中也具有优异的耐等离子体性能。薄膜等离子体暴露后，在侵蚀深度、表面粗糙度、纳米结构和透射率变化方面均取得了出色的结果。
Dense yttrium oxide film was prepared on a quartz substrate by the aerosol deposition process at the room temperature. The deposition rate was very high, 60 m/h. Thick film of 10 m was easily achievable on the quartz substrate. Transmission electron microscopy showed that the film was highly dense without voids and was composed of randomly oriented Y2O3 crystallites of sizes smaller than 20 nm. The interface between the film layer and the quartz substrate was homogeneous. The film (2-m thick) had a high transmittance (55-85%) in the wavelength region of 250-800 nm. The mechanical properties of the film were very good. The adhesion force of the interface between the Y2O3 layer and the quartz substrate was over 80 MPa. The Vickers hardness of the film was 7.7 GPa. The film also had an excellent plasma resistance in a gas mixture of CF4/O-2. Outstanding results were noted in eroded depth, surface roughness, nanostructure, and transmittance change after plasma exposure of the film.