Quantum electronic stability of atomically uniform films.
Quantum electronic stability of atomically uniform films.
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DOI：
10.1126/science.292.5519.1131
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发表时间：
2001-05
期刊：
影响因子：
56.9
通讯作者：
D. Luh;T. Miller;J. Paggel;M. Chou;T. Chiang
中科院分区：
文献类型：
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作者：
D. Luh;T. Miller;J. Paggel;M. Chou;T. Chiang
我们研究了沉积在 Fe(100) 基底上的厚度为 N = 1 至 15 单层的银薄膜的结构稳定性。光电发射光谱结果表明，N = 1、2 和 5 单层厚度的薄膜在 800 开尔文以上的温度下结构稳定，而其他厚度的薄膜在 400 开尔文左右的温度下不稳定并分叉成 N +/- 1 单层厚度的薄膜。结果与理论预测一致，理论预测认为与特定薄膜厚度相关的量子阱的电子能量对薄膜稳定性有重要贡献。
We have studied the structural stability of thin silver films with thicknesses of N = 1 to 15 monolayers, deposited on an Fe(100) substrate. Photoemission spectroscopy results show that films of N = 1, 2, and 5 monolayer thicknesses are structurally stable for temperatures above 800 kelvin, whereas films of other thicknesses are unstable and bifurcate into a film with N +/- 1 monolayer thicknesses at temperatures around 400 kelvin. The results are in agreement with theoretical predictions that consider the electronic energy of the quantum well associated with a particular film thickness as a significant contribution to the film stability.