Controlling highly dominated N configuration in N-doped graphene as oxygen reduction catalyst
Controlling highly dominated N configuration in N-doped graphene as oxygen reduction catalyst
复制标题
控制氮掺杂石墨烯中高度主导的氮构型作为氧还原催化剂
DOI：
10.1149/2.0701704jes
复制
发表时间：
2017
影响因子：
3.9
通讯作者：
Zidong Wei
中科院分区：
文献类型：
--
作者：
Baoshan Hu;Xiaoying He;Rui Wu;Yan Jin;Yawei Bian;Siguo Chen;Zidong Wei
吡啶-，吡咯-，和腈-N掺杂的石墨烯薄膜，每个优势大于80原子%，成功地与一个简单的快速加热辅助CVD工艺合成。此外，三个N构型可以通过改变反应时间和甲烷的参与来容易地调节。深入研究阐明吡啶-N是ORR活性的原因，与其他研究结果一致。
Pyridinic-, pyrrolic-, and nitrile-N doped graphene films with each dominance of more than 80 at% are successfully synthesized with a simple flash heating-assisted CVD process. Moreover, the three N configurations can be facilely tuned by the variation of reaction time and the participation of methane. Deep investigation elucidate that pyridinic-N is responsible for the ORR activity in good agreement with other investigations.