Chi 3 dispersion in planar tantalum pentoxide waveguides in the telecommunications window.
Chi 3 dispersion in planar tantalum pentoxide waveguides in the telecommunications window.
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DOI：
10.1364/ol.34.001135
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发表时间：
2009-04
期刊：
影响因子：
3.6
通讯作者：
Ruiqi Chen;M. Charlton;P. Lagoudakis
中科院分区：
文献类型：
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作者：
Ruiqi Chen;M. Charlton;P. Lagoudakis
本文报道了电信光谱窗口中平面Ta2O5光波导中三阶非线性极化率(X_1(3)或“X_3”)的色散。我们利用超短脉冲激发下三次谐波的观测作为CHI(3)的一种无参考表征方法，在1550 nm处获得了较大的非线性系数2×10(-13)esu。我们在电信窗口中观察到Ta2O5光波导中有效的三次谐波产生，揭示了这种材料体系在高速集成非线性光开关中的潜力。
We report on the dispersion of the third-order nonlinear susceptibility (chi(3) or "Chi 3") in planar Ta2O5 waveguides in the telecommunications spectral window. We utilize the observation of third-harmonic generation under ultrashort pulsed excitation as a reference-free characterization method of chi(3) and obtain a large nonlinear coefficient, 2x10(-13) esu, at 1550 nm. Our observation of efficient third-harmonic generation in Ta2O5 waveguides in the telecoms window reveals the potential of this material system in high-speed integrated nonlinear optical switches.