Growth of Grass Like Architectures on Si Substrate and Its Mechanism Study
Growth of Grass Like Architectures on Si Substrate and Its Mechanism Study
复制标题
DOI：
--
复制
发表时间：
2013
期刊：
影响因子：
--
通讯作者：
L. Hu;Y. Ju;Hosoi Atsushi
中科院分区：
文献类型：
--
作者：
L. Hu;Y. Ju;Hosoi Atsushi
以镍为催化剂，采用热氧化法在硅衬底上直接合成了草状结构。湿度和催化剂在草状建筑的制作中起着重要的作用。加热温度控制了草状结构的形态。利用扫描电镜（SEM，JSM-7000 FK）、X射线能谱（EDX）和X射线衍射（XRD）对产物进行了表征。草状结构大小约为8-70μm，叶宽1-2.5μm。研究了氧化、垂直应力和水平压应力对草状构筑物生长的影响。
Grass like architectures were synthesized directly on Silicon substrate by thermal oxidation method with nickel catalyst at low temperature. Humidity and catalyst played an important role in the fabrication of the grass like architectures. The morphology of the grass-like architectures was controlled by heating temperature. The grass like architectures were observed by scanning electron microscope (SEM, JSM-7000FK), Energy-dispersive X-ray (EDX) and X-ray diffraction (XRD). The grass like architectures were approximately 8-70μm in size with 1-2.5μm width leaves. The growth of grass like architectures affected by oxidation, vertical stress induced, and horizontal compressive stress was studied in details.