Second harmonic generation enhancement at the percolation threshold
Second harmonic generation enhancement at the percolation threshold
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DOI：
10.1063/1.4884121
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发表时间：
2014-06-16
影响因子：
4
通讯作者：
Dressel, Martin
中科院分区：
文献类型：
--
作者：
De Zuani, Stefano;Peterseim, Tobias;Dressel, Martin
我们系统地研究了金属半连续薄膜产生的二次谐波（SHG）信号作为大量样品的有效层厚度的函数。膜厚度的控制使我们能够精确地绘制逾渗阈值周围的区域。在近静态介电常数发散的临界厚度处，我们得到了一个尖锐而强烈的二次谐波峰。这发生在几乎接触颗粒的状态下，而薄膜还没有表现出金属的行为。这种大的SHG信号是通过使用薄膜沉积技术制造的样品获得的，该薄膜沉积技术易于晶片缩放。(C)2014 AIP Publishing LLC.
We systematically investigate the second harmonic generated (SHG) signal created by metallic semi-continuous thin films as a function of the effective layer thickness for a large number of samples. The control of the film thickness allows us to precisely map the region around the percolation threshold. We obtain a sharp and intense SHG peak at the critical thickness where the near static permittivity diverges. This happens in the regime of almost touching particles while the thin film does not behave as a metal yet. This large SHG signal is obtained with samples fabricated using a thin film deposition technique that is easily wafer scalable. (C) 2014 AIP Publishing LLC.