Postdeposition treatment of IBS coatings for UV applications with optimized thin-film stress properties
Postdeposition treatment of IBS coatings for UV applications with optimized thin-film stress properties
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DOI：
10.1364/ao.53.00a212
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发表时间：
2014-02-01
期刊：
影响因子：
1.9
通讯作者：
Stenzel, Olaf
中科院分区：
文献类型：
--
作者：
Bischoff, Martin;Nowitzki, Tobias;Stenzel, Olaf
离子束溅射(IBS)用于紫外光应用的单层和多层涂层设计在沉积过程以及特定的沉积后处理之后进行了审查。薄膜在紫外区有较高的内压应力和中等的吸收损耗。由于采用了可控的沉积后处理工艺，可以显著降低吸收损耗和高压应力。我们表明，SiO_2和HfO_2多层膜设计的剩余薄膜应力可以通过沉积后处理的参数来具体地控制。对于复杂的多层涂层，甚至可以实现零应力和拉应力。(C)2013年美国光学学会
Ion-beam-sputtering (IBS) single-layer and multilayer coating designs for UV applications were examined after the deposition process as well as after a defined postdeposition treatment. High internal compressive film stress as well as moderate absorption losses in the UV spectral range were measured at the as-deposited thin films. Due to a controlled postdeposition treatment process, the absorption losses and the high compressive stress can be reduced significantly. We show that the remaining thin-film stress of SiO2 and HfO2 multilayer designs can be specifically manipulated by the parameters of the postdeposition treatment. Even zero and tensile stress can be achieved for complex multilayer coatings. (C) 2013 Optical Society of America