An optical test for identifying topological insulator thin films
An optical test for identifying topological insulator thin films
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DOI：
10.1364/oe.21.008564
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发表时间：
2013-04-08
期刊：
影响因子：
3.8
通讯作者：
Inoue, Jun-ichi
中科院分区：
文献类型：
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作者：
Inoue, Jun-ichi
随着对拓扑绝缘体（TI）的新化合物的研究变得越来越广泛，开发一种能够识别TI的实验技术变得越来越重要。在这项工作中，我们从理论上提出了一个简单的光学方法区分拓扑和传统的绝缘体薄膜。由透射通过TI薄膜和由TI薄膜反射的波组成的电磁干扰波对入射电磁波的圆偏振方向敏感。基于这一事实，我们可以通过观察干扰波来识别TI。这种方法是直接的，因此应该推动TI的研究。(C)2013年美国光学学会
As the search for new compounds of a topological insulator (TI) becomes more extensive, it is increasingly important to develop an experimental technique that can identify TIs. In this work, we theoretically propose a simple optical method for distinguishing between topological and conventional insulator thin films. An electromagnetic interference wave consisting of waves transmitted through and reflected by the TI thin film is sensitive to the circular polarization direction of the incident electromagnetic wave. Based on this fact, we can identify a TI by observing the interference wave. This method is straightforward, and thus should propel TI research. (C) 2013 Optical Society of America