Overview of high intensity ion source development in the past 20 years at IMP.

Overview of high intensity ion source development in the past 20 years at IMP.
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DOI:
10.1063/1.5129399
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发表时间:
2020-02
期刊:
The Review of scientific instruments
影响因子:
--
通讯作者:
L. Sun;H. Zhao;H. Zhao;W. Lu;J. Guo;Y. Cao;Q. Wu;C. Qian;Y. Yang;X. Fang;
L. Sun;H. Zhao;H. Zhao;W. Lu;J. Guo;Y. Cao;Q. Wu;C. Qian;Y. Yang;X. Fang;
中科院分区:
其他
文献类型:
--
作者:
L. Sun;H. Zhao;H. Zhao;W. Lu;J. Guo;Y. Cao;Q. Wu;C. Qian;Y. Yang;X. Fang;

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回顾了国际原子能机构近20年来离子源的发展。出于多方面的目的,IMP的研究和开发工作涉及几种类型的离子源,即,高电荷ECR(电子回旋共振)离子源、强微波离子源或2.45GHz强束ECR离子源和激光离子源(LIS)。在ECR离子源的研制中,研制出了SECRAL(Superconducting ECR ion source with Advanced design in Lanzhou)、兰州ECR离子源和兰州全永磁ECR离子源系列,工作频率范围为10-28 GHz。研制了脉冲宽度为8 ns、最大输出能量为8 J的Nd:YAG激光器,用于强流短脉冲离子束的激光电离,并研制了微波离子源,用于强流加速器或应用。本文综述了国际原子能科学院(IMP)强流离子源的发展,特别是第四代ECR离子源(第一代第四代ECR离子源)的现状、SECRAL源产生高电荷记录离子束的情况、关键技术研究等方面的最新进展和新成果。
Ion source development over the last 20 years at the IMP is reviewed. For versatile purposes, several types of ion sources have been involved in the research and development work at the IMP, i.e., the highly charged ECR (Electron Cyclotron Resonance) ion source, intense microwave ion source or the 2.45 GHz intense beam ECR ion source, and laser ion source (LIS). In the development of ECR ion sources, SECRAL (Superconducting ECR ion source with Advanced design in Lanzhou), Lanzhou ECR ion source, and Lanzhou all permanent magnet ECR ion source series have been made, which can cover the operation microwave frequency range of 10-28 GHz. The LIS with an Nd:YAG laser with a maximum output energy of 8 J in 8 ns pulse duration has been developed for very intense short pulse ion beams from solid materials such as C, Ti, Ni, Ag, and so on. Microwave ion sources have been built to produce intense pulsed or direct current beams from several mA to 100 mA for either high intensity accelerators or applications. This paper will give an overview of the high intensity ion source development at the IMP, especially on the recent progress and new results, such as the status of the fourth generation ECR ion source (first fourth generation ECR ion source), the production of recorded highly charged ion beams with SECRAL sources, key technology research studies, and so on.