MIES and UPS study of O‐predosed nickel surface reduction by H2 deposition
MIES and UPS study of O‐predosed nickel surface reduction by H2 deposition
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MIES 和 UPS 研究通过 H2 沉积还原 O 预掺杂镍表面
DOI：
10.1002/sia.1359
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发表时间：
2002
影响因子：
1.7
通讯作者：
A. Nadan
中科院分区：
文献类型：
--
作者：
G. Fanjoux;B. Lescop;A. Nadan
本研究的目的是研究在高温（530 K）下，使用亚稳态撞击电子能谱（MIES）和UPS（与He（I））实验技术，氢预掺杂的镍表面的还原。这两种技术都使我们能够遵循的价带的电子结构在氢气沉积过程中的演变。功函数的变化似乎是直接相关的表面的氧覆盖，并表现出两个阶段：诱导期，在此期间没有发生还原反应;快速反应期对应于氧的还原。反应机理需要羟基化合物的形成，但由于它们在较低温度下以水的形式热解吸，在MIES和UPS光谱中没有观察到明显的OH特征。
The present study was aimed at investigating the reduction by hydrogen of an oxygen‐predosed nickel surface at high temperature (530 K) using metastable impact electron spectroscopy (MIES) and UPS (with He(I)) experimental techniques. Both techniques have allowed us to follow the evolution of the electronic structure of the valence band during H2 deposition. The work function variation seems to be related directly to the oxygen coverage of the surface and exhibits two stages: an induction period during which no reduction reaction occurs; a rapid reaction period corresponding to the reduction of oxygen. The reaction mechanism entails the formation of hydroxyl compounds but, owing to their thermal desorption at lower temperature in the form of water, no evident OH features have been observed in the MIES and UPS spectra.