Direct nanoimprint of inorganic-organic hybrid glass
Direct nanoimprint of inorganic-organic hybrid glass
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DOI：
10.1116/1.2201457
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发表时间：
2006-05
影响因子：
1.4
通讯作者：
M. Okinaka;K. Tsukagoshi;Y. Aoyagi
中科院分区：
文献类型：
--
作者：
M. Okinaka;K. Tsukagoshi;Y. Aoyagi
无机-有机杂化玻璃纳米压印已被证明是通过聚硅烷聚合物转化成SiO2基材料。与传统的无机图案化方法相比，所提出的技术具有低温和非常短的处理时间的优点。在优化的压印条件下，可以精确地形成50 nm ~ 25 μm的线和空间结构，其深宽比为4.8。在350°C下热处理后，确认结构仅收缩5%。图案化的膜在丙酮、酸或碱溶液中显示出很小的溶解度。此外，当将其浸入氢氟酸中时，仅观察到非常小的变化。结果表明，所提出的工艺能够实现具有良好的热稳定性和化学稳定性的无机-有机杂化玻璃的纳米图案化。
Inorganic-organic hybrid glass nanoimprint has been demonstrated by the transformation of polysilane polymer into SiO2-based material. The proposed technique has the advantages of low temperature and very short processing time over conventional inorganic patterning methods. Line and space structures ranging from 50nmto25μm could be precisely patterned, and an aspect ratio of 4.8 was achieved for an optimized imprint condition. Only 5% shrinkage of the structure was confirmed after heat treatment at 350°C. The patterned film shows little solubility in acetone, acid, or alkali solution. Furthermore, only a very small change is observed when it is dipped in hydrofluoric acid. It was demonstrated that the proposed process enables nanopatterning of inorganic-organic hybrid glass with good thermal and chemical durabilities.