Edge trapping of exciton-polariton condensates in etched pillars
Edge trapping of exciton-polariton condensates in etched pillars
复制标题
蚀刻柱中激子-极化子凝聚体的边缘捕获
DOI：
10.1063/1.4983832
复制
发表时间：
2017
影响因子：
4
通讯作者：
K. West
中科院分区：
文献类型：
--
作者：
D. Myers;J. Wuenschell;B. Ozden;J. Beaumariage;D. Snoke;L. Pfeiffer;K. West
在这封信中，我们提出了一种研究激子-极化子在具有浅边陷阱的大型蚀刻柱状结构中的凝聚。采用光刻技术和BCl3/Cl2反应离子刻蚀技术制备了≈100μm×100μm柱子。沿刻蚀边缘出现一个低能区，从外缘开始出现极小的≈7 μm。相对于水平中心区，陷阱的深度为0.5~1.5 meV，在角落处陷阱最深。通过在柱子中间非共振泵送，我们能够在靠近边缘和角落的陷阱中产生玻色-爱因斯坦凝聚体。这种凝聚体开始时是一组沿边缘不同点的不相连的凝聚体，但随着极化子密度的增加，它变成了单一的单能凝聚体。类似的边缘陷阱可以用来沿着边缘产生浅的一维陷阱，或者使用各种蚀刻几何和比例来产生其他更复杂的陷阱。
In this letter, we present a study of the condensation of exciton-polaritons in large etched pillar structures that exhibit shallow edge trapping. The ≈100 μm × 100 μm pillars were fabricated using photolithography and a BCl3/Cl2 reactive ion etch. A low energy region emerged along the etched edge, with the minima ≈7 μm from the outer edge. The depth of the trap was 0.5–1.5 meV relative to the level central region, with the deepest trapping at the corners. We were able to produce a Bose-Einstein condensate in the trap near the edges and corners by pumping non-resonantly in the middle of the pillar. This condensate began as a set of disconnected condensates at various points along the edges but then became a single mono-energetic condensate as the polariton density was increased. Similar edge traps could be used to produce shallow 1D traps along edges or other more complex traps using various etch geometries and scales.
影响因子：
3.7
作者：
Askitopoulos, A.;Liew, T. C. H.;Lagoudakis, P. G.
通讯作者：
Lagoudakis, P. G.
影响因子：
3.7
作者：
Askitopoulos, A.;Ohadi, H.;Lagoudakis, P. G.
通讯作者：
Lagoudakis, P. G.