Disulfide oligomer on .alpha.-FeOOH: adsorption state and photoadsorption
Disulfide oligomer on .alpha.-FeOOH: adsorption state and photoadsorption
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DOI：
10.1021/la00009a024
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发表时间：
1995-09
期刊：
影响因子：
3.9
通讯作者：
Hiroyoshi Kuramoto;Y. Arai;M. Yamamoto;S. Ozeki
中科院分区：
文献类型：
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作者：
Hiroyoshi Kuramoto;Y. Arai;M. Yamamoto;S. Ozeki
An epoxy-terminated disulfide oligomer (α,ω-(2,3-epoxypropane)hexa[1,1'-methylenedioxybis(2-thioethane)]; EDS) in 1,1,1-trichloroethane was adsorbed with a density 2.8 times greater than that expected for EDS lying flat on α-FeOOH at 303.2 K. The EDS adsorption was interpreted by a loop-train-tail model. XPS and DRIFT spectra showed that about 15% of the sulfur atom in the monolayer was chemisorbed to form a monosulfoxide and the rest of the sulfur atoms in the train parts may interact weakly with the surfaces. The irradiation by UV light promoted the EDS adsorption. This seems to relate to the formation of some oxidized sulfur species, such as a disulfoxide and a thiosulfone, which may be formed by oxidation due to holes produced by photoexcitation of an n-type semiconductor. The adsorption state and photoadsorption mechanism of EDS molecules at possible sites on α-FeOOH surfaces are discussed.
