Scanning probe anodization: Nanolithography using thin films of anodically oxidizable materials as resists
Scanning probe anodization: Nanolithography using thin films of anodically oxidizable materials as resists
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扫描探针阳极氧化：使用可阳极氧化材料的薄膜作为抗蚀剂的纳米光刻
DOI：
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发表时间：
1996
期刊：
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通讯作者：
N. Nakagiri
中科院分区：
文献类型：
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作者：
H. Sugimura;N. Nakagiri
我们报告扫描探针显微镜（SPM）纳米光刻，使用薄膜图案化扫描探针阳极氧化作为抗蚀剂。通过化学气相沉积在Si衬底上制备了由三甲基甲硅烷基[-Si（CH 3）3]基团组成的有机硅烷单层。然后通过SPM尖端下方诱导的阳极反应导致单层的局部降解来图案化。通过在NH 4F/H2 O2水溶液中的区域选择性化学蚀刻将抗蚀剂上的制造图案转移到衬底Si中。因此，成功地制造了窄于100 nm的凹槽。我们还开发了另一种适用于SPM光刻的抗蚀剂系统，该系统与各种表面（包括绝缘体）兼容。抗蚀剂由覆盖有氟烷基硅烷单层的薄Ti膜组成。单层细胞沿着头端扫描迹线降解。在稀HF溶液中蚀刻该图案化的抗蚀剂。对底层Ti膜的化学腐蚀选择性地进行。
We report scanning probe microscope (SPM) nanolithography that uses thin films patternable by scanning probe anodization as resists. An organosilane monolayer composed of trimethylsilyl [−Si(CH3)3] groups was prepared by chemical vapor deposition on a Si substrate. It was then patterned through the localized degradation of the monolayer as a result of anodic reactions induced beneath a SPM tip. The fabricated patterns on the resist were transferred into the substrate Si by area‐selective chemical etching in an aqueous NH4F/H2O2 solution. Consequently, grooves narrower than 100 nm were successfully fabricated. We have also developed another resist system for SPM lithography that is compatible with a wide range of surfaces, including insulators. The resist consisted of a thin Ti film covered with a fluoroalkylsilane monolayer. The monolayer was degraded along a tip‐scanning trace. This patterned resist was etched in a dilute HF solution. The chemical etching of the underlying Ti film proceeded selectively i...