In situ measurement of capacitance : A method for fabricating nanoglass
In situ measurement of capacitance : A method for fabricating nanoglass
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DOI：
10.1111/j.1551-2916.2005.00257.x
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发表时间：
2005-06
影响因子：
3.9
通讯作者：
Y. Ohta;M. Kitayama;K. Kaneko;S. Toh;F. Shimizu;K. Morinaga
中科院分区：
文献类型：
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作者：
Y. Ohta;M. Kitayama;K. Kaneko;S. Toh;F. Shimizu;K. Morinaga
在不同频率（20、100、1、3、10和30 kHz）下热处理期间，原位测量了Na 2 O-SiO2玻璃的电容。发现玻璃的电容在一定时间后突然减小。在此阶段将玻璃淬火。通过X射线衍射和透射电子显微镜证实，这种电容的降低与玻璃基质中微晶的形成有关。观察到微晶的尺寸在约10 nm的范围内。
The capacitance of the Na2O–SiO2 glass was measured in situ during heat treatment at various frequencies, 20, 100, 1, 3, 10, and 30 kHz. It was found that the capacitance of the glass abruptly decreases after a certain duration. The glass was quenched at this stage. It was confirmed by the X-ray diffraction and transmission electron microscopy that this decrease of capacitance was associated with the formation of crystallites in the glass matrix. The size of crystallites was observed to be in the range of about 10 nm.