Co–Pt∕Pt thin films with perpendicular magnetization and a high coercivity prepared by gas flow sputtering
Co–Pt∕Pt thin films with perpendicular magnetization and a high coercivity prepared by gas flow sputtering
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DOI：
10.1063/1.1847171
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发表时间：
2005-05
影响因子：
3.2
通讯作者：
S. Mifuji;H. Sakuma;K. Ishii
中科院分区：
文献类型：
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作者：
S. Mifuji;H. Sakuma;K. Ishii
采用磁控溅射的方法在SiO_2玻璃衬底上沉积铂底层，然后用气流溅射的方法在50°C的衬底上沉积Co-铂合金薄膜。在成分为0~55at%Pt时，实现了垂直磁化。在200~400℃温度范围内，研究了它们的结构和磁性能随铂含量和热处理温度的变化。对于溅射的Co-铂(30 Nm)/铂(200 Nm)薄膜，垂直矫直力随着铂含量的增加而增加，在25at%时有最大值4.7kOe。在此组成下，垂直各向异性常数为1.8×106erg/cc。在Ar气氛中进行后退火后，薄膜的矫顽力和各向异性常数均增大。在300℃时，它们的最大值分别为7.0kOe和4.0×106erg/cc。
Pt underlayers were deposited on an SiO2 glass substrate by magnetron sputtering, and then Co–Pt alloy films were deposited on them at 50 °C by gas flow sputtering. Perpendicular magnetization was realized at a composition ranging from 0 to 55 at % Pt. Their structure and magnetic properties were studied as a function of Pt content and annealing temperature from 200 to 400 °C. For as-sputtered Co–Pt(30nm)∕Pt(200nm) films, it was found that the perpendicular coercivity increased with increase in Pt content and had a maximum value of 4.7 kOe at 25 at % Pt. At this composition, the perpendicular anisotropy constant was 1.8×106erg∕cc. Post-annealing of the films in an Ar atmosphere resulted in increases in both coercivity and anisotropy constant. At 300 °C, they reached maximum values of 7.0 kOe and 4.0×106erg∕cc, respectively.