UV Direct Laser Interference Patterning of polyurethane substrates as tool for tuning its surface wettability
UV Direct Laser Interference Patterning of polyurethane substrates as tool for tuning its surface wettability
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DOI：
10.1016/j.apsusc.2015.11.119
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发表时间：
2016-06-30
影响因子：
6.7
通讯作者：
Lasagni, Andres F.
中科院分区：
文献类型：
--
作者：
Estevam-Alves, Regina;Guenther, Denise;Lasagni, Andres F.
直接激光干涉图案化（DLIP）是在不同材料上制造微米和亚微米图案的通用工具。在这项工作中，DLIP被用来产生周期性的表面结构的聚氨酯（PU）基板上的空间周期范围从0.5到5.0倍。研究了激光能量密度对微图案质量和形貌特征的影响。为了表征所产生的结构的表面形貌，利用原子力显微镜（AFM）、扫描电子显微镜（SEM）和共聚焦显微镜（CFM）。结果表明，利用该方法可以制备出空间周期小于500 nm的高质量无缺陷周期性线状图案，空间周期大于2.0 pin时，结构深度在0.88 ~ 1.25 pin之间，空间周期在500 nm ~ 1.0 pin之间时，结构深度在270 nm左右。水在处理过的表面上的接触角的测量允许识别主要取决于结构化表面的空间周期和填充因子的各向异性润湿行为。(C)2015爱思唯尔B. V.保留所有权利。
Direct Laser Interference Patterning (DLIP) is a versatile tool for the fabrication of micro and submicropatterns on different materials. In this work, DLIP was used to produce periodic surface structures on polyurethane (PU) substrates with spatial periods ranging from 0.5 to 5.0 tim. The influence of the laser energy density on the quality and topographical characteristics of the produced micropatterns was investigated. To characterize the surface topography of the produced structures, Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM) and Confocal Microscopy (CFM) were utilized. It was found that high quality and defect free periodic line-like patterns with spatial periods down to 500 nm could be fabricated, with structure depths between 0.88 up to 1.25 pin for spatial periods larger than 2.0 pin and up to 270 nm for spatial periods between 500 nm and 1.0 tim. Measurements of the contact angle of water on the treated surface allowed to identify an anisotropic wetting behavior depending mainly on the spatial period and filling factor of the structured surfaces. (C) 2015 Elsevier B.V. All rights reserved.