Influence of Ta2O5 on the micromorphology and high-temperature oxidation resistance of MoSi2-based composite coating for protecting niobium
Influence of Ta2O5 on the micromorphology and high-temperature oxidation resistance of MoSi2-based composite coating for protecting niobium
复制标题
Ta2O5对MoSi2基铌保护复合涂层微观形貌及高温抗氧化性能的影响
DOI:
10.1016/j.matchar.2021.111328
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发表时间:
2021-09
影响因子:
4.7
通讯作者:
Feng Peizhong
中科院分区:
文献类型:
--
作者:
Zhu Lu;Wang Xiaohong;Mao Chenhao;Ren Xuanru;Feng Peizhong
Spent MoSi2-based materials were recycled as coating raw-materials, and MoSi2and MoSi2-Ta2O5coatings were fabricated to protect niobium using Spark Plasma Sintering (SPS). The micromorphology and anti-oxidation properties of the coatings at 1773 K were researched. Penetrating cracks were detected in the MoSi2coating surface while no cracks appeared in MoSi2-Ta2O5composite coating since the thermal expansion mismatch of the substrate and coating was reduced by adding Ta2O5. (Mo,Nb)5Si3diffusion layer formed in MoSi2-Ta2O5composite coatings, showing good metallurgical combination between substrate and coating. After oxidation at 1773 K for 20 h, crack-free Ta-Si-O layer with low oxygen permeability was formed on the composite coating. Compared with the oxidized MoSi2coating, lower mass gain is gained by MoSi2-Ta2O5composite coating under same conditions, presenting improved oxygen-barrier properties at high temperature.
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影响因子:
5.2
作者:
Li-xiang Wu;Wei‐Ming Guo;Shikuan Sun;Lin-lin Zhu;Ling-Yong Zeng;Hua-Tay Lin;P. Xiao
通讯作者:
Li-xiang Wu;Wei‐Ming Guo;Shikuan Sun;Lin-lin Zhu;Ling-Yong Zeng;Hua-Tay Lin;P. Xiao
影响因子:
6.2
作者:
Ren Weili;Ouyang Fenfen;Ding Biao;Zhong Yunbo;Yu Jianbo;Ren Zhongming;Zhou Lanzhang
通讯作者:
Zhou Lanzhang
影响因子:
8.3
作者:
Le Sun;Q. Fu;Jia Sun
通讯作者:
Le Sun;Q. Fu;Jia Sun
影响因子:
5.2
作者:
P. R. Taleghani;S. Bakhshi;M. Erfanmanesh;G. H. Borhani;R. Vafaei
通讯作者:
P. R. Taleghani;S. Bakhshi;M. Erfanmanesh;G. H. Borhani;R. Vafaei
DOI:
10.1016/j.ijrmhm.2013.06.010
发表时间:
2013-11
影响因子:
3.6
作者:
Shubin Wang;Cheng Xu;Yongbin Ding;Xinghong Zhang
通讯作者:
Shubin Wang;Cheng Xu;Yongbin Ding;Xinghong Zhang