Vortex flow characteristics of high‐Tc flux flow transistors
Vortex flow characteristics of high‐Tc flux flow transistors
复制标题
高Tc磁通流晶体管的涡流特性
DOI：
10.1063/1.355865
复制
发表时间：
1994
影响因子：
3.2
通讯作者：
M. Suzuki
中科院分区：
文献类型：
--
作者：
K. Miyahara;S. Kubo;M. Suzuki
用共蒸发的YBaCuO薄膜制备了高温超导磁通流晶体管。对该装置的涡流特性进行了实验研究。根据外加磁场对I-V特性的依赖关系，测量了涡流沿通道的流动速度。当偏置电流为3-6 mA时，电流密度为3.6-6.9×105m/S。这个数值与超常-超结中沿势垒区域流动的约瑟夫森涡旋的数值相同，比第二类金属超导薄膜中的数值大三个数量级以上。
High‐Tc superconducting flux flow transistors were fabricated from thin films of coevaporated YBaCuO. The vortex flow characteristics of the devices were experimentally investigated. The flow velocity of a vortex along a channel was measured from the applied magnetic field dependence of the I‐V characteristics. It is 3.6–6.9×105 m/s when the bias current is 3–6 mA. This value is of the same order as that of a Josephson vortex flowing along a barrier region in a super‐normal‐super junction, and more than three orders of magnitude larger than that in type‐II metal superconducting thin films.