Microstructure evolution of Ti-Si-C-Ag nanocomposite coatings deposited by DC magnetron sputtering
Microstructure evolution of Ti-Si-C-Ag nanocomposite coatings deposited by DC magnetron sputtering
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DOI：
10.1016/j.actamat.2010.08.018
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发表时间：
2010-12
期刊：
影响因子：
9.4
通讯作者：
J. Lauridsen;P. Eklund;J. Jensen;H. Ljungcrantz;Å. Öberg;E. Lewin;U. Jansson;A. Flink;H. Högberg;L. Hultman
中科院分区：
文献类型：
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作者：
J. Lauridsen;P. Eklund;J. Jensen;H. Ljungcrantz;Å. Öberg;E. Lewin;U. Jansson;A. Flink;H. Högberg;L. Hultman
采用高速磁控溅射技术在Ti-Si-C-Ag复合靶上制备了由Ag和TiCx（x<1）微晶组成的纳米复合涂层。使用不同的靶组合物来获得Si含量为1.13at.%的涂层，同时改变C/Ti比和Ag含量。电子显微镜，氦离子显微镜，X射线光电子能谱和X射线衍射跟踪Ag偏析过程中的沉积和非晶SiC的可能分解。观察到Ag和Si之间的Eu 3+相互作用，并且Ag形成随涂层厚度增加而粗化的螺纹晶粒。可以通过控制Ag沉淀物的形状和分布来定制涂层的水平或垂直导电性。所制备的涂层的硬度在10- 18 GPa范围内，电阻率在77-142μΩcm范围内。
Nanocomposite coatings consisting of Ag and TiCx(x<1) crystallites in a matrix of amorphous SiC were deposited by high-rate magnetron sputtering from Ti–Si–C–Ag compound targets. Different target compositions were used to achieve coatings with a Si content of ∼13at.%, while varying the C/Ti ratio and Ag content. Electron microscopy, helium ion microscopy, X-ray photoelectron spectroscopy and X-ray diffraction were employed to trace Ag segregation during deposition and possible decomposition of amorphous SiC. Eutectic interaction between Ag and Si is observed, and the Ag forms threading grains which coarsen with increased coating thickness. The coatings can be tailored for conductivity horizontally or vertically by controlling the shape and distribution of the Ag precipitates. Coatings were fabricated with hardness in the range 10–18GPa and resistivity in the range 77–142μΩcm.