Optical fiber-driven low energy electron gun for ultrafast streak diffraction
Optical fiber-driven low energy electron gun for ultrafast streak diffraction
复制标题
用于超快条纹衍射的光纤驱动低能电子枪
DOI:
10.1063/1.5039737
复制
发表时间:
2018
影响因子:
4
通讯作者:
R. Miller
中科院分区:
文献类型:
--
作者:
Chiwon Lee;G. Kassier;R. Miller
Here, we present an optical fiber-based electron gun designed for the ultrafast streaking of low-energy electron bunches. The temporal profile of the few tens of the picosecond long electron bunch composed of 200 electrons is well characterized using a customized streak camera. Detailed analysis reveals that the stretched optical trigger pulse owing to the dispersion effects inside the waveguide dominantly determines the temporal length of the low density electron bunch. This result illustrates the capability to control the observable time-window in the streak diffraction experiment by tailoring geometrical parameters of the fiber source and its coupling condition. With the electrostatic Einzel lens system integrated on the fiber-based cathode, we also demonstrate spatial focusing of the electron beam with the RMS spot size of 98 μm and imaging of the static low-energy electron diffraction pattern of monolayer graphene in the electron kinetic energy range of 1.0–2.0 keV.Here, we present an optical fiber-based electron gun designed for the ultrafast streaking of low-energy electron bunches. The temporal profile of the few tens of the picosecond long electron bunch composed of 200 electrons is well characterized using a customized streak camera. Detailed analysis reveals that the stretched optical trigger pulse owing to the dispersion effects inside the waveguide dominantly determines the temporal length of the low density electron bunch. This result illustrates the capability to control the observable time-window in the streak diffraction experiment by tailoring geometrical parameters of the fiber source and its coupling condition. With the electrostatic Einzel lens system integrated on the fiber-based cathode, we also demonstrate spatial focusing of the electron beam with th...
影响因子:
56.9
作者:
Ishikawa, Tadahiko;Hayes, Stuart A.;Miller, R. J. Dwayne
通讯作者:
Miller, R. J. Dwayne