The structure and properties of chromium nitride coatings deposited using dc, pulsed dc and modulated pulse power magnetron sputtering
The structure and properties of chromium nitride coatings deposited using dc, pulsed dc and modulated pulse power magnetron sputtering
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DOI：
10.1016/j.surfcoat.2009.12.013
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发表时间：
2010-04-15
影响因子：
5.4
通讯作者：
Wang, Jun
中科院分区：
文献类型：
--
作者：
Lin, Jianliang;Moore, John J.;Wang, Jun
在封闭场非平衡磁控溅射系统中，比较了连续直流磁控溅射（dcMS）、中频脉冲直流磁控溅射（PMS）和调制脉冲功率（MPP）等离子体在Ar/N2气氛中溅射Cr靶时的离子能量分布和离子通量。结果表明，dcMS等离子体表现出较低的离子能量和离子通量; PMS等离子体产生多个高离子能量区域的中等离子通量;而MPP等离子体与dcMS和PMS等离子体相比，表现出显著增加的具有低离子能量的目标Cr+和气体离子的数量。立方CrN涂层沉积使用这三种技术与浮动衬底偏压。利用X射线衍射仪、扫描电镜、透射电镜对涂层的结构和性能进行了表征。纳米压痕、微划痕和球盘磨损测试。研究发现，在平均靶功率相似的情况下，MPP CrN沉积的沉积速率略低于dcMS沉积的沉积速率，但高于PMS沉积的沉积速率。在dcMS和PMS条件下沉积的涂层，而没有援助的衬底偏压表现出大的柱状晶粒与清晰的晶界。另一方面，在MPP CrN涂层中，大柱状晶生长的中断伴随着晶粒的再成核和生长。MPP CrN涂层具有致密的显微组织、细小的晶粒尺寸和光滑的表面，具有高硬度（24.5和26 GPa）、改善的耐磨性（COF = 0.33和0.36）和附着力，这是MPP等离子体的低离子能量和高离子通量轰击的结果。由爱思唯尔公司出版
The time averaged ion energy distributions and ion fluxes of continuous dc magnetron sputtering (dcMS), middle frequency pulsed dc magnetron sputtering (PMS), and modulated pulse power (MPP) magnetron sputtering plasmas were compared during sputtering of a Cr target in an Ar/N-2 atmosphere in a closed field unbalanced magnetron sputtering system. The results showed that the dcMS plasma exhibited a low ion energy and ion flux; the PMS plasma generated a moderate ion flux of multiple high ion energy regions: while the MPP plasma exhibited a significantly increased number of target Cr+ and gas ions with a low ion energy as compared to the dcMS and PMS plasmas. Cubic CrN coatings were deposited using these three techniques with a floating substrate bias. The structure and properties of the coatings were characterized using X-ray diffraction, scanning electron microscopy, transmission electron microscopy. nanoindentation, microscratch and ball-on-disk wear tests. It was found that the deposition rate of the MPP CrN depositions was slightly lower than those of the dcMS depositions, but higher than in the PMS depositions at similar average target powers. The coatings deposited in the dcMS and PMS conditions without the aid of the substrate bias exhibited large columnar grains with clear grain boundaries. On the other hand, the interruption of the large columnar grain growth accompanied with the renucleation and growth of the grains was revealed in the MPP CrN coatings. The MPP CrN coatings exhibited a dense microstructure, fine grain size and smooth surface with high hardness (24.5 and 26 GPa), improved wear resistance (COF = 0.33 and 0.36) and adhesion, which are the results of the low ion energy and high ion flux bombardment from the MPP plasma. Published by Elsevier B.V.