Improvement of gaschromic properties of WO3 films by high rate reactive sputter-deposition on an inclined substrate
Improvement of gaschromic properties of WO3 films by high rate reactive sputter-deposition on an inclined substrate
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倾斜基底上高速反应溅射沉积提高 WO3 薄膜气致变色性能
DOI：
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发表时间：
2017
期刊：
影响因子：
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通讯作者：
and Hao Lei
中科院分区：
文献类型：
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作者：
Yoji Yasuda;Yoichi Hoshi(1);Shin-ichi Kobayashi;Takayuki Uchida;Yutaka Sawada;Meihan Wang;and Hao Lei
