Wafer-scale silicon photonic switches beyond die size limit
Wafer-scale silicon photonic switches beyond die size limit
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DOI:
10.1364/optica.6.000490
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发表时间:
2019-04-20
期刊:
影响因子:
10.4
通讯作者:
Wu, Ming C.
中科院分区:
文献类型:
--
作者:
Seok, Tae Joon;Kwon, Kyungmok;Wu, Ming C.
Fast optical switches have been proposed as a promising alternative to enable continual scaling of data centers with increasing size and data rates. Silicon photonics is a compelling platform for large-scale integrated photonic switches, leveraging advanced manufacturing foundries for electronic integrated circuits. In the past decade, the port counts of silicon photonic switches have increased steadily to 128 x 128. Further scaling of the switch is constrained by the maximum reticle size (2-3 cm) of lithography tools. Here, we propose to use wafer-scale integration to overcome the die size limit. As a proof of concept demonstration, we fabricated a 240 x 240 switch by lithographically stitching a 3 x 3 array of identical 80 x 80 switch blocks across reticle boundaries. Stitching loss is substantially reduced (0.004 dB) by tapering the waveguide width to 10 mu m. The fabricated switch on a 4 cm x 4 cm chip exhibits a maximum on-chip loss of 9.8 dB, an ON/OFF ratio of 70 dB, and switching times of less than 400 ns. To our knowledge, this is the largest integrated photonic switch ever reported. The loss-to-port count ratio (0.04 dB/port) is also the lowest. (C) 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement