Minimized thermal conductivity in highly stable thermal barrier W/ZrO2 multilayers
Minimized thermal conductivity in highly stable thermal barrier W/ZrO2 multilayers
复制标题
DOI:
10.1007/s00339-016-0405-0
复制
发表时间:
2016-10-01
影响因子:
2.7
通讯作者:
Krebs, Hans-Ulrich
中科院分区:
文献类型:
--
作者:
Doering, Florian;Major, Anna;Krebs, Hans-Ulrich
Nanoscale thin-film multilayer materials are of great research interest since their large number of interfaces can strongly hinder phonon propagation and lead to a minimized thermal conductivity. When such materials provide a sufficiently small thermal conductivity and feature in addition also a high thermal stability, they would be possible candidates for high-temperature applications such as thermal barrier coatings. For this article, we have used pulsed laser deposition in order to fabricate thin multilayers out of the thermal barrier material ZrO2 in combination with W, which has both a high melting point and high density. Layer thicknesses were designed such that bulk thermal conductivity is governed by the low value of ZrO2, while ultrathin W blocking layers provide a high number of interfaces. By this phonon scattering, reflection and shortening of mean free path lead to a significant reduction in overall thermal conductivity even below the already low value of ZrO2. In addition to this, X-ray reflectivity measurements were taken showing strong Bragg peaks even after annealing such multilayers at 1300 K. Those results identify W/ZrO2 (m)ultilayers as desired thermally stable, low-conductivity materials.