INFLUENCE OF AN EXTERNAL AXIAL MAGNETIC-FIELD ON THE PLASMA CHARACTERISTICS AND DEPOSITION CONDITIONS DURING DIRECT-CURRENT PLANAR MAGNETRON SPUTTERING
INFLUENCE OF AN EXTERNAL AXIAL MAGNETIC-FIELD ON THE PLASMA CHARACTERISTICS AND DEPOSITION CONDITIONS DURING DIRECT-CURRENT PLANAR MAGNETRON SPUTTERING
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DOI：
10.1116/1.578874
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发表时间：
1994-03-01
期刊：
影响因子：
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通讯作者：
SUNDGREN, JE
中科院分区：
文献类型：
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作者：
IVANOV, I;KAZANSKY, P;SUNDGREN, JE
通过将轴对称外部磁场 B(ext) 叠加到磁控管源的原始磁场来改变直流磁控溅射系统中基底和靶材之间的磁场分布。磁控管使用 Mo 靶进行操作，并研究了 Ne、Ar 和 Kr 放电。使用圆柱形和扁平朗缪尔探针测量基板附近的等离子体参数作为Be的函数。研究发现，磁场强度的变化导致等离子体参数发生较大变化，如载流子密度、等离子体和浮动电位、电子温度和电子能量分布函数，而阴极放电过程保持不变。发现 Mo 沉积通量与 B(ext) 无关，但通过改变 B(ext)，负偏压衬底支架的离子饱和电流可以改变约 50 倍。除了离子通量之外，到达基底的另外两个高能物质源——溅射的 Mo 原子和从靶反射的 Ne、Ar 和 Kr 中性粒子也使用 TRIM 计算机代码进行计算，并考虑了靶和基底之间路径上的气相散射。
The magnetic field distribution between substrate and target in a dc magnetron sputtering system was altered by superimposing an axially symmetric external magnetic field B(ext) to the original field of the magnetron source. The magnetron was operated with a Mo target and Ne, Ar, and Kr discharges were investigated. The plasma parameters in the substrate vicinity were measured as a function of Be, using both cylindrical and flat Langmuir probes. It was found that the variation of the magnetic field strength caused large changes in the plasma parameters, such as charge carrier density, plasma and floating potentials, electron temperature, and electron energy distribution function while the cathode discharge processes remained unchanged. The Mo deposition flux was found to be independent of B(ext), but the ion saturation current to the negatively biased substrate holder could be changed by a factor of approximately 50 by varying B(ext). In addition to the ion flux, the two other sources of energetic species arriving at the substrate-the sputtered Mo atoms and the reflected Ne, Ar, and Kr neutrals from the target were calculated using a TRIM computer code and taking into account gas phase scattering en route between target and the substrate.