A New Approach to Plasma CVD of TiO2 Photocatalyst on γ-Al2O3 Pellet Filled in Dielectric Barrier Discharges at Atmospheric Pressure
A New Approach to Plasma CVD of TiO2 Photocatalyst on γ-Al2O3 Pellet Filled in Dielectric Barrier Discharges at Atmospheric Pressure
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DOI：
10.1088/1009-0630/6/6/006
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发表时间：
2004-12
影响因子：
1.7
通讯作者：
Zhu Aimin;Nie Longhui;Z. Xiuling;Shi Chuan;S. Zhi-min;Xu Yong
中科院分区：
文献类型：
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作者：
Zhu Aimin;Nie Longhui;Z. Xiuling;Shi Chuan;S. Zhi-min;Xu Yong
在常压和室温条件下，采用γ-Al2O3颗粒填充介质阻挡放电诱导等离子体CVD法制备了负载型TiO2/γ-Al2O3光催化剂。TiO2/γ-Al2O3光催化剂的光催化活性比Degussa P25高，比热CVD制备的光催化活性高得多。
A supported TiO2/γ-Al2O3 photocatalyst has been prepared by γ-Al2O3 pellet-filled dielectric barrier discharges induced plasma CVD at atmospheric pressure and room temperature. The TiO2/γ-Al2O3 photocatalyst exhibits higher photocatalytic activity than Degussa P25, and much higher photocatalytic activity than that prepared by thermal CVD.