Angle-resolved scattering and reflectance of extreme-ultraviolet multilayer coatings: measurement and analysis.
Angle-resolved scattering and reflectance of extreme-ultraviolet multilayer coatings: measurement and analysis.
复制标题
极紫外多层涂层的角度分辨散射和反射率：测量和分析。
DOI：
10.1364/ao.49.001503
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发表时间：
2010
期刊：
影响因子：
1.9
通讯作者：
A. Duparré
中科院分区：
文献类型：
--
作者：
S. Schröder;T. Herffurth;M. Trost;A. Duparré
粗糙度引起的光散射严重影响光学元件的性能，特别是在短波长。我们提出了一个独立的仪器，角度分辨散射和反射率测量在13.5 nm的极紫外（EUV）光谱范围。所获得的动态范围甚至允许高质量的EUV反射镜在非常光滑的基片上散射进行研究。对于Mo/Si多层，已经观察到总散射损失的几个百分点，这取决于衬底质量以及涂层过程中的粗化和平滑效果。讨论了估计粗糙度对散射损失影响的不同近似模型，并与实验结果进行了比较。
Roughness-induced light scattering critically affects the performance of optical components, in particular at short wavelengths. We present a stand-alone instrument for angle-resolved scattering and reflectance measurements at 13.5 nm in the extreme-ultraviolet (EUV) spectral range. The achieved dynamic range allows even the scattering of high-quality EUV mirrors on extremely smooth substrates to be investigated. For Mo/Si multilayers, total scatter losses of several percent have been observed, depending on the substrate qualities as well as on roughening and smoothing effects during coating. Different approximate models for estimating the impact of roughness on scatter losses are discussed and compared with experimental results.