Preparation of pulsed DC magnetron deposited Fe‐doped SnO2 coatings
Preparation of pulsed DC magnetron deposited Fe‐doped SnO2 coatings
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DOI：
10.1002/pssa.201532882
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发表时间：
2016-07
期刊：
影响因子：
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通讯作者：
M. Kormunda;D. Fischer;A. Hertwig;U. Beck;M. Sebik;N. Esser
中科院分区：
文献类型：
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作者：
M. Kormunda;D. Fischer;A. Hertwig;U. Beck;M. Sebik;N. Esser
在 50 kHz 直流脉冲磁控溅射放电中沉积铁掺杂 SnO2 涂层。在选定的气体混合物中，脉冲持续时间为 4 μs，从纯氩到 60% 的氧气，总压恒定为 0.2 Pa。使用带有 Fe 嵌入的 SnO2 单靶。质谱研究检测到与气体相关的离子 Ar+、O2+ 和 O+，其中最后一种在氧含量较高时成为主要的正离子。原子氧离子具有较高的能量，因为它是由目标表面上的碰撞引起的解离产生的。检测到与锡相关的物质为 Sn+ 和 SnO+。未检测到 SnO2+ 物质。通过使用含有氧气的气体混合物以及等离子体中相应数量的 Sn 相关物质，沉积速率会降低。氧气的增加也显着增加了薄膜的薄层电阻。 XPS 研究表明，使用额外的氧气可降低铁浓度。但涂层中的 O/Sn 比率是恒定的，与薄膜中增加的 FeO/Fe 比率相反。通过椭圆偏振光谱法对涂层进行的额外分析表明，极化率和介电常数与沉积过程中使用的氧气量有关。相比之下，研究发现各层的吸收不存在这种依赖性。
Iron‐doped SnO2 coatings were deposited in a 50 kHz DC‐pulsed magnetron sputtering discharge. The pulses had a duration of 4 μs in selected gas mixtures from pure argon up to 60% of oxygen at a constant total pressure of 0.2 Pa. A single target of SnO2 with Fe inset was used. The mass spectrometry study detected the gas‐related ions Ar+, O2+ and O+, where the last one becomes the dominant positive ion at higher oxygen contents. Atomic oxygen ions had a higher energy as it resulted from the collision‐caused dissociation on the target surface. The tin‐related species were detected as Sn+ and SnO+. SnO2+ species were not detected. The deposition rate decreased by using gas mixtures with oxygen as well as the corresponding amount of Sn‐related species in the plasma. The increase of oxygen also increased significantly the sheet resistance of the films. The XPS study showed that the iron concentration decreased by using additional oxygen. But the O/Sn ratio in the coatings was constant, contrary to the increased FeO/Fe ratio in the films. An additional analysis of the coatings by spectroscopic ellipsometry has shown a dependence of the polarizability and the permittivity on the amount of oxygen used during the deposition. In contrast, the study has found no such dependence for the absorption of the layers.