Atomic Layer Deposition of Iron Sulfide and Its Application as a Catalyst in the Hydrogenation of Azobenzenes
Atomic Layer Deposition of Iron Sulfide and Its Application as a Catalyst in the Hydrogenation of Azobenzenes
复制标题
硫化铁的原子层沉积及其在偶氮苯加氢催化剂中的应用
DOI:
10.1002/anie.201700449
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发表时间:
2017
期刊:
影响因子:
--
通讯作者:
Wang Xinwei
中科院分区:
文献类型:
--
作者:
Shao Youdong;Guo Zheng;Li Hao;Su Yantao;Wang Xinwei
The atomic layer deposition (ALD) of iron sulfide (FeSx) is reported for the first time. The deposition process employs bis(N,N′‐di‐tert‐butylacetamidinato)iron(II) and H2S as the reactants and produces fairly pure, smooth, and well‐crystallized FeSxthin films following an ideal self‐limiting ALD growth behavior. The FeSxfilms can be uniformly and conformally deposited into deep narrow trenches with aspect ratios as high as 10:1, which highlights the broad applicability of this ALD process for engineering the surface of complex 3D nanostructures in general. Highly uniform nanoscale FeSxcoatings on porous γ‐Al2O3powder were also prepared. This compound shows excellent catalytic activity and selectivity in the hydrogenation of azo compounds under mild reaction conditions, demonstrating the promise of ALD FeSxas a catalyst for organic reactions.