Atomic Layer Deposition of Iron Sulfide and Its Application as a Catalyst in the Hydrogenation of Azobenzenes

Atomic Layer Deposition of Iron Sulfide and Its Application as a Catalyst in the Hydrogenation of Azobenzenes
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硫化铁的原子层沉积及其在偶氮苯加氢催化剂中的应用

DOI:
10.1002/anie.201700449
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发表时间:
2017
期刊:
Angewandte Chemie International Edition
影响因子:
--
通讯作者:
Wang Xinwei
Wang Xinwei
中科院分区:
其他
文献类型:
--
作者:
Shao Youdong;Guo Zheng;Li Hao;Su Yantao;Wang Xinwei

文献摘要

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首次报道了硫化铁(FeSx)的原子层沉积(ALD)。该沉积工艺采用双(N,N ′-二叔丁基乙脒基)铁(II)和H2S作为反应物,并按照理想的自限制ALD生长行为产生相当纯、光滑和结晶良好的FeSx薄膜。FeSx薄膜可以均匀且保形地沉积到深窄沟槽中,纵横比高达10:1,这突出了这种ALD工艺在一般复杂3D纳米结构表面工程中的广泛适用性。在多孔γ-Al2O3粉末上制备了高度均匀的纳米FeSx涂层。该化合物在温和的反应条件下在偶氮化合物的氢化中显示出优异的催化活性和选择性,证明ALD FeSx作为有机反应催化剂的前景。
The atomic layer deposition (ALD) of iron sulfide (FeSx) is reported for the first time. The deposition process employs bis(N,N′‐di‐tert‐butylacetamidinato)iron(II) and H2S as the reactants and produces fairly pure, smooth, and well‐crystallized FeSxthin films following an ideal self‐limiting ALD growth behavior. The FeSxfilms can be uniformly and conformally deposited into deep narrow trenches with aspect ratios as high as 10:1, which highlights the broad applicability of this ALD process for engineering the surface of complex 3D nanostructures in general. Highly uniform nanoscale FeSxcoatings on porous γ‐Al2O3powder were also prepared. This compound shows excellent catalytic activity and selectivity in the hydrogenation of azo compounds under mild reaction conditions, demonstrating the promise of ALD FeSxas a catalyst for organic reactions.