Removal of residual layer by liquid transfer imprint lithography using roll-to-roll UV-NIL
Removal of residual layer by liquid transfer imprint lithography using roll-to-roll UV-NIL
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DOI：
10.1016/j.mee.2015.01.040
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发表时间：
2015-06-15
影响因子：
2.3
通讯作者：
Taniguchi, Jun
中科院分区：
文献类型：
--
作者：
Moro, Masatoshi;Taniguchi, Jun
纳米压印技术是一种非常有用的制作纳米级图形器件的工具。特别地，卷对卷（RtR）紫外（UV）NIL提供纳米级结构的高通量转移。然而，RtR UV-NIL是基于膜的工艺，因此残留层往往较厚。为了控制残余层厚度，我们尝试实施RtR液体转移压印光刻（LTIL）。LTIL可以通过在液相中分离模具和基板来去除多余的树脂。在这种情况下，过量的树脂残留在基板上，并且具有较薄树脂的模具被转移到另一目标基板并固化。在RtR运动期间，通过控制压区压力和UV曝光定时，也可以进行这种LTIL过程。也就是说，在一次旋转期间从进料膜分离过量的树脂，并且在下一次旋转中进行UV曝光以固化树脂。我们准备了一个辊模具与粘附复制模具的这个过程中，我们表明，与LTIL的残留厚度比没有LTIL薄。此外，加热和两轮的LTIL是有效的获得一个薄的残留层。70 ℃的辊模温度、1.8m/min的进料速度和两轮LTIL产生纳米级结构到膜上的无残留层转移。RtR LTIL将有助于具有薄残留层的纳米级图案的连续、高速转移。(C)2015 Elsevier B. V.版权所有。
Nanoimprint lithography (NIL) is a very useful tool for the fabrication of nanoscale pattern devices. In particular, roll-to-roll (RtR) ultraviolet (UV) NIL offers a high-throughput transfer of nanoscale structures. However, RtR UV-NIL is a film based process, and so the residual layer tends to be thick. To control the residual layer thickness, we have attempted to implement RtR liquid transfer imprint lithography (LTIL). LTIL can remove excess resin by splitting the mold and substrate in the liquid phase. In this case, excess resin remains on the substrate, and the mold with a thinner resin is transferred to another target substrate and cured. This LTIL process is also possible during RtR motion by controlling the nip pressure and UV exposure timing. That is, the excess resin is split off from the feed film during one rotation, and UV exposure to cure the resin is carried out in the next rotation. We prepared a roll mold with adhered replica molds for this process, and we show that the residual thickness with LTIL is thinner than that without LTIL In addition, heating and two rounds of LTIL are effective for obtaining a thin residual layer. A roll mold temperature of 70 degrees C, feed speed of 1.8 m/min, and two rounds of LTIL produced no-residual-layer transfer of nanoscale structures onto the film. RtR LTIL will contribute to the continuous, high-speed transfer of nanoscale patterns that have a thin residual layer. (C) 2015 Elsevier B.V. All rights reserved.