Processing dependent behavior of soft imprint lithography on the 1--10-nm scale
Processing dependent behavior of soft imprint lithography on the 1--10-nm scale
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DOI：
10.1109/tnano.2006.874051
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发表时间：
2006-05-01
影响因子：
2.4
通讯作者：
Rogers, John A.
中科院分区：
文献类型：
--
作者：
Hua, Feng;Gaur, Anshu;Rogers, John A.
本文研究了在接近1-mN区域的分辨率下操作的软纳米压印光刻技术的各个方面。使用单壁碳纳米管(直径在0.5到5 nm之间)和高分辨率的倍半硅氧烷电子束图案层(线宽和高度分别类似于10 nm和20 nm)作为模板制作的聚合物模具的系统研究揭示了分辨率极限与聚合物加工条件的关系。特别是，使用模具和模制材料的单一聚合物选择，印迹结果表明，旋转浇注和固化聚合物的条件在很大程度上决定了可以实现的分辨率和复制保真度。优化的工艺使压印聚合物表面的均方根粗糙度类似于0.26 nm或更低，分辨率高达1 nm。这些特性明显好于以前使用这些相同聚合物在未优化条件下获得的结果。各种模塑聚合物，包括双酚-F环氧树脂、聚丙烯酸和聚氨酯，都显示出类似的高保真印记能力。不同的程序使具有中等纵横比和尺寸类似于10纳米的特征的精确浮雕复制成为可能。结果表明，除了材料的选择外，工艺条件的选择对于在1-10 nm范围内实现高保真的软纳米压印光刻是极其重要的。
This paper examines aspects of a soft nanoimprint lithography technique for operation at resolutions that approach the 1-mn regime. Systematic studies using polymer molds made with single walled carbon nanotubes (diameters between 0.5 and 5 nm) and high-resolution electron beam patterned layers of hydrogen silsesquioxane (line widths and heights similar to 10 and 20 nm, respectively) as templates reveal a dependence of the resolution limits on the polymer processing conditions. In particular, using a single choice of polymers for the molds and the molded materials, imprint results show that the conditions for spin casting and curing the polymers determine, to a large degree, the resolution and replication fidelity that can be achieved. Optimized procedures enable imprinted polymer surfaces that have a root mean squared surface roughness of similar to 0.26 nm or lower and a resolution as high as similar to 1 nm. These characteristics are significantly better than previous results obtained using these same polymers with unoptimized conditions. A diversity of molded polymers, including Bisphenol-F epoxy resin, polyacrylic acid, and polyurethane, show similar high-fidelity imprinting capabilities. Different procedures enable accurate relief replication for features with modest aspect ratios and dimensions of similar to 10 nm. The results indicate that choice of processing conditions is; in addition to materials selections, extremely important in achieving high-fidelity soft nanoimprint lithography in the 1-10-nm regime.