Atom Probe Tomography Analysis of Boron and/or Phosphorus Distribution in Doped Silicon Nanocrystals
Atom Probe Tomography Analysis of Boron and/or Phosphorus Distribution in Doped Silicon Nanocrystals
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DOI:
10.1021/acs.jpcc.6b06197
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发表时间:
2016-08
影响因子:
3.7
通讯作者:
K. Nomoto;H. Sugimoto;A. Breen;A. Ceguerra;T. Kanno;S. Ringer;I. Wurfl;G. Conibeer;M. Fujii
中科院分区:
文献类型:
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作者:
K. Nomoto;H. Sugimoto;A. Breen;A. Ceguerra;T. Kanno;S. Ringer;I. Wurfl;G. Conibeer;M. Fujii
Silicon nanocrystals (Si NCs) are intensively studied for optoelectronic and biological applications due to having highly attractive features such as band engineering. Although doping is often used to control the optical and electrical properties, the related structural properties of solely doped and codoped Si NCs are not well-understood. In this study, we report the boron (B) and/or phosphorus (P) distribution in Si NCs embedded in borosilicate glass (BSG), phosphosilicate glass (PSG), and borophosphosilicate glass (BPSG) using atom probe tomography (APT). We compared solely and codoped Si NCs grown at different temperatures so that we may compare the effects of codoping and temperature on the B and/or P distribution. Proximity histograms and cluster analyses reveal that there exist boron-rich layers surrounding Si NCs and also B–P clusters within the Si NCs. Raman spectra also show a structural change between codoped Si NCs in solids and free-standing codoped Si NCs. These results lead us to understand...